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LinkedIn: Christoph Noelscher | Berufsprofil - LinkedIn
Sehen Sie sich das Profil von Christoph Noelscher auf LinkedIn an, dem weltweit größten beruflichen Netzwerk. Christoph Noelscher hat 1 Job im Profil ...
LinkedIn: Christoph Noelscher | Berufsprofil - LinkedIn
Themen, die Christoph Noelscher wichtig sind: Tierschutz; Bürgerrecht und soziales Handeln; Wirtschaftliche Unterstützung benachteiligter Gruppen; Umwelt ...
LinkedIn: Christoph Noelscher - LinkedIn
上领英,在全球领先职业社交平台查看Christoph Noelscher的职业档案。Christoph的职业档案列出了1 个职位。查看Christoph的完整档案,结识职场人脉和查看相似 ...
Interessen
Dominique Savignac - Patents
www.freshpatents.com
Inventors: Haiko Rolff, Carla Byloos, Christoph Noelscher, Nicolo Morgana, Roderick Koehle, Molela Moukara, Ralf Neubauer, Rainer Pforr, Dominique ...
Business-Profile
patentbuddy: Christoph Noelscher
ADVANCED MASK TECHNOLOGY CENTER GMBH & CO. KG, Nuremberg, DE
Private Homepages
Christoph Noelscher's Email & Phone - Spitzmueller AG - Nürnberg...
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Click to get Christoph Noelscher's Role: Senior consultant for public funding and financing @ Spitzmueller AG, Nürnberg Area, Germany.
Bücher
Christoph Noelscher | Infineon Technologies | 36 PublicationsSciSpace by Typeset
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Christoph Noelscher is an academic researcher from Infineon Technologies. The author has contributed to research in topic(s): Layer (electronics) ...
Double line shrink lithography at k1 = | Christoph Noelscher;...
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Double line shrink lithography at k1 = | Christoph Noelscher; Marcel Heller; Boris Habets; Matthias Markert; Uli Scheler; Peter Moll | download...
USPTO Image File Wrapper Petition Decisions 0344google.com
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... CHRISTOPH NOELSCHER NUMBERG GERMANY cc: GERO G. MCCLELLAN PATTERSON & SHERIDAN, LLP POST OAK BOULEVARD SUITE HOUSTON, TX ...
USPTO Image File Wrapper Petition Decisions 0344books.google.com.co › books
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Wise Pe^tions Examiner Office of Petitions CHRISTOPH NOELSCHER NUMBERG GERMANY cc: GERO G. MCCLELLAN PATTERSON & SHERIDAN, ...
Dokumente zum Namen
Optimal SRAF placement for process window enhancement in 65-nm/45-nm...
www.deepdyve.com
Klaus Herold, Christoph Noelscher. a. , Paul Schroeder. Infineon Technologies NA, Route 52, Hopewell Junction NY , USA. a. Qimonda Dresden ...
Veröffentlichungen allgemein
Christoph Noelscher
spie.org
SPIE Profile of Christoph Noelscher, Carl Zeiss SMT AG. SPIE Profiles is a networking platform for optics and photonics professionals.
Balancing of alternating phase-shifting masks for practical ...SPIE
spie.org
... Christoph Noelscher, Infineon Technologies AG (Germany) Rainer Pforr, Infineon Technologies AG (Germany). Published in SPIE Proceedings Vol : 20th ...
Nicolo Morgana - SPIEspie.org › profile › Nicolo.Morgana-2920
spie.org
Christoph Noelscher, Thomas Henkel, et al. Proc. SPIE , Optical Microlithography XXI. KEYWORDS: Lithography, Atrial fibrillation, Calibration, Etching, 3D ...
Double patterning down to k1=0.15 with bilayer resist | (2008) |...
spie.org
Author(s): Christoph Noelscher; Franck Jauzion-Graverolle; Marcel Heller; Matthias Markert; Bee-Kim Hong; Ulrich Egger; Dietmar Temmler ...
Sonstiges
Christoph Noelscher | LinkedIn
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View Christoph Noelscher's professional profile on LinkedIn Helene-Lange Gymnasium Fuerth,; Carl Zeiss SMT AG,; Qimonda Dresden GmbH & Co. OHG.
CN C - 燃气轮机组受热部件的冷却方法- Google Patentswww.google.com › patents
www.google.com
US A1 * Christoph Noelscher Method for operating a steam turbine , and a turbine system provided with a steam turbine that ...
CN A - 一种光刻仪及其器件制造方法- Google Patentswww.google.com › patents
www.google.com
US B2 * Christoph Noelscher Filter system for light source. US B2 * Asml Netherlands B.V. Plasma ...
DE A1 - Verfahren zum Herstellen einer Struktur auf ...patents.google.com › patent › und
patents.google.com
US A1 * Christoph Noelscher Photosensitive coating for enhancing a contrast of a photolithographic exposure.
Christoph%20Noelscher: বিনামুল্যে ডাউনলোড. ইবুক লাইব্রেরি....
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Christoph%20Noelscher: বিনামুল্যে ডাউনলোড. ইবুক লাইব্রেরি. Z-Library-তে অন-লাইন বইয়ের দোকান | BookSC. Download books for free. Find books
Application aspects of the Si-CARL bilayer processSPIE Digital Library
www.spiedigitallibrary.org
von M Sebald · Zitiert von: 37 — Michael Sebald, Joerg Berthold, Michael Beyer, Rainer. Leuschner, Christoph Noelscher, et al. Michael Sebald, Joerg Berthold, Michael Beyer, Rainer Leuschner ...
Balancing of alternating phase-shifting masks for practical...
www.spiedigitallibrary.org
SPIE Digital Library Proceedings
US B2 - Semiconductor device, method for manufacturing a...
patents.google.com
A semiconductor device with a substrate includes a structure. The structure has a first part and a second part. At least one section of the edge of the...
Ultra dense trench-gated power-device with the reduced drain ...www.google.sr › patents
www.google.sr
US A1 * Christoph Noelscher Method for Processing a Spacer Structure, Method of Manufacturing an Integrated Circuit, ...
US A - Process for producing high density conductive lines...
patents.google.com
A process of fabricating a semiconductor device on a substrate with closely spaced high density conductive lines is provided. A thin insulating layer is...
Citations: "Methods of Manufacturing a Semiconductor Device and ...paperdigest.org
www.paperdigest.org
Applicant(s): Christoph Noelscher. Citations: Filter. Citation, Title, Inventor(s), Applicant(s), Assignee(s), Filing Date. 4 · Method of manufacturing ...
Inventors list Nm-No - Patent applicationpatentsencyclopedia.com
www.patentsencyclopedia.com
... Christoph Noelscher, DE, Nuernberg, Lithographic Mask and Method of Forming a Lithographic Mask, 11. Sara A. Noeman, EG, October ...
Double patterning down to k 1 =0.15 with litho trim - Patent Lenswww.lens.org › lens › scholar › article
www.lens.org
Jan 1, 2009; Authors: Christoph Noelscher 1 , Marcel Heller 2 , Matthias Markert 2 , Dietmar Temmler 2 , Franck Jauzion-Graverolle 2 , Nicolo Morgana
Robert Norris email address & phone numberRocketReach
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Employee Christoph Noelscher's profile photo. Christoph Noelscher. Senior consultant for public funding and financing. Bavaria, Germany. View. 2. spitzmueller.
Towards Manufacturing of Advanced Logic Devices by ...Academia.edu
www.academia.edu
... Christoph Noelscher, et.al., "Double patterning down to k1 = with litho trim", J. Micro/Nanolith. MEMS MOEMS 8, (2009); doi: [3] ...
Double line shrink lithography at k1=0.16
www.infona.pl
The gain of up to a factor of two in resolution by an integrative method is investigated. Starting from a literature survey and an application scenario the...
Literatura académica sobre el tema "Carl A"Grafiati
www.grafiati.com
— ... Christoph Noelscher, Ulrich Scheler, Recai Sezi, Hellmut Ahne y Siegfried Birkle. "Application aspects of the Si-CARL bilayer process". En ...
Noelscher christoph专利- 专利顾如 - Patent Guruwww.patentguru.com › inventor › noelscher-christoph
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公开(公告)号: US A, 公开(公告)日: , 申请号: US ,398, 申请日: , 发明(设计)人: Noelscher, Christoph Noelscher, Christoph ...
Double line shrink lithography at k1 = PDF Free Download
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The gain of up to a factor of two in resolution by an integrative method is investigated. Starting from a literature sur...
Investigation of self-aligned phase-shifting reticles by simulation ...
www.spiedigitallibrary.org
Christoph Noelscher and Leonhard Mader "Investigation of self-aligned phase-shifting reticles by simulation techniques", Proc. SPIE 1463, Optical/Laser ...
Verwandte Suchanfragen zu Christoph Noelscher
Marcel Heller Dietmar Temmler Matthias Markert | Carl Zeiss Franck Jauzion-Graverolle Henryk Noelscher |
Personen Vorname "Christoph" (43400) Name "Noelscher" (3) |
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